PHOSPHORUS IMPLANT IN SILICON DEPTH PROFILE STANDARD

General description

This Standard Reference Material (SRM) is intended for use in calibrating secondary ion response to minor and trace levels of phosphorus in a silicon matrix by the analytical technique of secondary ion mass spectrometry (SIMS). SRM 2133 is intended for calibrating the response of a SIMS instrument for phosphorus in a silicon matrix under a specific set of instrumental conditions. It may also be used by a laboratory as a transfer standard for the calibration of working standards of phosphorus in silicon. This SRM consists of a 1 cm × 1 cm single crystal silicon substrate that has been ion-implanted with the isotope 31P at a nominal energy of 100 keV. For more information, please refer to the COA and SDS.

SRM 2133_cert SRM 2133 _SDS

Other Notes

Example analytes are listed below as a reference. Please download a current certificate at nist.gov/SRM for current analytes and certified values.
Phosphorus (³¹P)

Legal Information

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SRM is a registered trademark of National Institute of Standards and Technology